The article mentions, but doesn't explicitly state, that they're going to be using electron beam lithography. Makes sense for their low volume and/or prototype fab goal, but I'm curious how well that would work for prototyping to fab at high volume with the likes of TSMC or Intel.
I would assume that re-targeting a design to a different fab's process would change enough about it that you might as well just do verification in simulation rather than sidetrack through Fab2.
The article mentions, but doesn't explicitly state, that they're going to be using electron beam lithography. Makes sense for their low volume and/or prototype fab goal, but I'm curious how well that would work for prototyping to fab at high volume with the likes of TSMC or Intel.
I would assume that re-targeting a design to a different fab's process would change enough about it that you might as well just do verification in simulation rather than sidetrack through Fab2.
That's the one that Sam Zeloof is working on, "having lithographically microfabricated various chips in his garage as early as the age of 17"
https://en.wikipedia.org/wiki/Sam_Zeloof
Great! Hopefully we can get 10 year behind technology from small fabs. There's so much you can do with a laptop from 2016
One of the most interesting technologies that is not about LLMs/AIs.
Is this an ASML competitor?
No, quoting the article:
> only really suits prototyping and low-volume runs rather than high-volume production at commercial foundries